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Test standard and method for photosensitive liquids of PS plate
(Cite Type A9 as an instance)

1 Viscosity
1.1 Standard: 6.0±0.2 Unit: cps
1.2 Test method
At first, use a capillary viscosity meter to suck-back enough photosensitive liquid then immerse in 25℃constant temperature water channel for 10 minutes. Secondly, record the time (t s) of the photosensitive liquid flowing past the two lines of the capillary viscosity meter. The capillary viscosity coefficient is a characteristic parameter of the capillary viscosity meter and it is attached with the capillary viscosity meter.
1.3 Calculation formula:
Viscosity = capillary viscosity coefficient × t

2 Photosensitive film thickness
2.1 Standard: 2.12-2.16 Unit: g/m2
2.2 Test method
At first, cut the cooling PS plate coated with the photosensitive liquid into 10cm × 10cm shape and weigh the plate as W1. Secondly, use acetone to wash out the photosensitive film of the plate then weigh the plate as W2 after drying and cooling. Finally, calculate the thickness of the photosensitive film based on the difference of W1 and W2.
2.3 Calculation formula
Photosensitive film thickness = (W1-W2) × 100

3 Film thickness retention of alkali resistance
3.1 Standard: 95-97% No unit
3.2 Test method
At first, cut the cooling PS plate coated with the photosensitive liquid into 10cm × 10cm shape and weigh the plate as W1. Secondly, immerse the plate in 25℃ 3%Na2SiO3 + 0.4%NaOH developer for two minutes then weigh the plate as W2 after drying and cooling. Finally, use acetone to wash out the photosensitive film of the plate then weigh the plate as W3 after drying and cooling.
3.3 Calculation formula
Film thickness retention of alkali resistance = (W2-W3)/(W1-W3) ×100%

4 Solvent residual amount
4.1 Standard: 3-5% No unit
4.2 Test method
At first, cut the cooling PS plate coated with the photosensitive liquid into 10cm × 10cm shape and weigh the plate as W1. Secondly, dry the plate in 100℃ oven for ten minutes then weigh the plate as W2 after cooling. Finally, use acetone to wash out the photosensitive film of the plate then weigh the plate as W3 after drying and cooling.
4.3 Calculation formula
Solvent residual amount = (W1-W2)/(W1-W3) ×100%

5 Photosensitivity
5.1 Standard: 100-110 Unit: mj/cm2
5.2 Test method
Use Ugra plate control wedge 1982 as film to expose the plate coated with the photosensitive liquid with different exposure energy then develop in 5%Na2SiO3 developer for 30 seconds. The exposure energy is the photosensitivity of the plate while the second step of the gray step guide of the developed image is clear and the third step is unclear.

6 Developing latitude
6.1 Standard: A. Strong alkali developing latitude: The photosensitive film of the plate is not
corroded after developed 30 seconds in 6% Na2SiO3 + 0.6%NaOH developer.
B. Weak alkali developing latitude: The blank space of the plate is clear after developed 30 seconds in 2% Na2SiO3 developer.
6.2 Test method
A. Strong alkali developing latitude: Expose the plate coated with the photosensitive liquid with 50mj/cm2 exposure energy then develop in 6% Na2SiO3 + 0.6%NaOH developer for 30 seconds to gain the image. The photosensitive film of the image is not corroded.
B. Weak alkali developing latitude: Expose the plate coated with photosensitive liquid with 100mj/cm2 exposure energy then develop in 2% Na2SiO3 developer for 30 seconds. The blank space of the plate is clear.

7 Film thickness retention of isopropyl alcohol resistance
7.1 Standard: ≧70% No unit
7.2 Test method
At first, cut the PS plate coated with the photosensitive liquid into 10cm × 10cm shape, dry in 100℃ oven for five minutes and weigh the plate as W1 after cooling. Secondly, immerse the plate in 25% isopropyl alcohol aqueous for two hours, wash the plate with clear water then weigh the plate as W2 after drying and cooling. Finally, use acetone to wash out the photosensitive film of the plate then weigh the plate as W3 after drying and cooling.
7.3 Calculation formula
Film thickness retention of isopropyl alcohol resistance = (W1-W2)/(W1-W3) ×100%

8 Abrasion resistance
8.1 Standard: Complete 10% dot and continuous 20μline
8.2 Test method
Fixed the developed plate in the abrasion-resistant equipment, add some quartz sand, phosphoric acid, rubber stopper, isopropyl alcohol and water, seal off and turn round for one hour. Examine the dots and micro-lines.

 
     
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